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About EMLC 2006

Like the conferences in 2004 and 2005 the 22nd European Mask and Lithography Conference, EMLC2006 was held in Dresden. Attendance consisted of 250 mask and lithography experts as well as 28 technical exhibitors from January 23 to 26, 2006.

The three-day conference was dedicated to the science, technology, engineering, and application of mask and lithography technologies and associated processes. It gave an overview of the present status in mask and lithography technologies as well as future strategies for photomask makers. It also provided an opportunity for mask producers and users to become acquainted with new developments and results. The conference focused on the important fields of photomask lithography technologies and manufacturing processes. Beside sessions on Advanced Lithography and Simulation, Metrology, DFM&MDP, Mask Making, Mask Repair and Mask Cleaning, and EUV we organized a session for Nano Imprint Lithography because of the growing interest in this technology. Thursday there were two sessions on Immersion Lithography, both organized with the support of IMEC.

In 2006 the program committee accepted 58 papers. For the first time there were more papers submitted from outside Europe than within. There were thirty papers from the USA, Canada, Japan, Korea, and Taiwan. Twenty-eight were from Europe including Belarus and Russia. The biggest contributor was the USA. We had seventy-eight companies involved in generating the papers as authors and presenters. This demonstrated a worldwide, intensive and interactive cooperation between many companies.

As conference welcoming speaker we invited Ministerialdirigent Jörg Geiger, Head of the Research Department in the Saxon State Ministry of Science and Fine Arts. As the Keynote Speaker we invited Dr. Kücher from the Fraunhofer Center Nanoelectronic Technology, CNT, in Dresden. He talked about “The Nanoelectronic Challenge – CNT a New Approach for Research and Manufacturing”.

EMLC 2006 Highlights

Invited Welcome Speaker

A short Summary

EMLC 2006 -Program and invitation




2006 GMM