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Conference Topics



Deadline for Papers:  August 18, 2006

Download the Call for Papers EMLC 2007

 


The program committee requests contributions on the topics listed below.

 


Mask Manufacturing
 
Pattern Generation and Data Preparation
Photomask Processes and Materials
Mask Process Yield
PS-Mask and Masks for OPC
Mask for NGL: E-Beam, EUV, NIL…
Metrology
Defect Inspection and Repair
Cleaning and Pelliclization



Other Mask Topics


Mask Cost and Mask CoO
Future Mask Demand
Mask Business Considerations



Lithography and Mask Applications

Resolution Enhancement Techniques
MEEF
Resist
Mask Defect Printability
Optical Materials
Immersion Lithography
Immersion Defectivity
Alternate Immersion Fluids
Emerging Lithography Technologies: 157nm, EUV; X-Ray and Nanoimprint and embossing
Double exposure lithography strategies
Maskless lithography techniques


Mask and Lithography Equipment 

 

 
  
 























2006 GMM