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Bienvenue at Grenoble

The European Mask and Lithography EMLC2007 took place in Grenoble, France

The first time in its 23 year history the EMLC took place outside Germany. The VDE/VDI-GMM and the EMLC Organizing Committee were invited to Grenoble, France during last year’s conference in Dresden by CEA/LETI, MINATEC, and Toppan Photomasks.


The venue for EMLC 2007 is Minatec Conference Center,
the round building in the middle of the picture.


The EMLC2007 was held January 22nd to 25th 2007, at the MINATEC Conference Center in Grenoble, France. The conference has annually brought together scientists, researchers, engineers and technologists from research institutes and companies from around the world to present papers at the forefront of mask lithography and mask technology.  This years sessions included: “Hyper NA and Immersion”, “Inspection and Defect Printability”, “Mask Pattering and Process”, ”Metrology”, “Maskless Technologies”, “RET”, “NIL”, and “Mask Management and Simulation” .

This year the program committee accepted 72 papers. Since the EMLC2007 had no parallel sessions we accepted 50 papers as oral presentation and 22 as posters. Regarding the submitted paper we had a nice balance: 36 papers were submitted from European countries and 36 papers from countries from outside Europe. The largest number of papers was submitted by the USA (19), followed by Germany (18), and France (12).

We had 238 conference attendees, 67 different companies participated in papers as authors or co-authors which we feel demonstrates a worldwide cooperation in the lithography and photomask community.

Why the EMLC2007 took place in Grenoble?

Grenoble is one of the high-tech centers in Europe. The VDE/VDI-GMM organization together with the international EMLC2007 program committee agreed with the goal to intensify the integration of the French scientists into the EMLC international community.

Grenoble (its historical name is Cularo), was founded in the 3rd century by the Romans. Today it is one of the strongest High Tech areas in France and in Europe.  Since 2000, €4 Billion has been invested with €3 billion more to be invested by the end of 2007 for the nano-technology sector in the GrenobIe-Isère area.  With more than 38,000 jobs in Grenoble-Isère the information and communication technology (ICT) sector is one of the largest in the area, having enjoyed spectacular growth over the last 15 years.  Grenoble-Isere is France‘s second largest center for research, after the Paris area. lt has forged an international reputation in micro- and nano-technology, drawing on powerful, complementary skills in information technology and software.  As a result Grenoble-Isere is a key European center for innovation.
 

Highlights of the EMLC2007

The award for the ”Best Poster” of the EMLC2007, “Damage Free Megasonic Resonance Cleaning for the 45nm Design Rule”, was presented at the Banquet Dinner to Steve Osborne, Hidekazu Takahashia, Eric Wostera from Sigmameltec Ltd, 3-37-7 , Shimoassao, Asao-ku Kawasaki , 215-0022 Japan, and Valentine Baudiquez, Thomas Rode from the Advanced Mask Technologies Center, Raehznitzer Allee 9, 01109 Dresden, Germany

The ”Best Paper” award was given to the presentation titled “Predicting and Correcting for Image Placement Errors during the Fabrication of EUVL Masks”.  Authors Prof. Roxann L. Engelstad , J. Sohn, A. Mikkelson, M. Nataraju, and K. Turner from the Computational Mechanics Center, Mechanical Engineering Department, of the University of Wisconsin - Madison, WI, USA

The second “Best Paper” winners are Paul M. Harder, Thimothy A. Shedd from the Multiphase Flow and Visualization and Analysis Laboratory Dept. of Mechanical Engineering of the University of Wisconsin, Madison, WI, USA, for their paper titled “Contact angles and liquid loss behaviour of high index fluids

The third best paper was  “Progress in EUV Photoresist Technology” by authors Thomas I. Wallow, Ryoung-han Kim, Bruno La Fontaine Advanced Micro Devices, Sunnyvale, CA 94088Patrick P. Naulleau, Center for X-Ray Optics, Lawrence Berkeley National Laboratory, Berkeley, CA 94720; Chris N. Anderson, EECS Department, University of California, Berkeley, CA 94720 and Richard L. Sandberg, Department of Physics and JILA, University of Colorado, Boulder, CO 80309


WOW

This is the third time in 4 years that scientists from the University of Wisconsin have earned “Best Paper” honors at EMLC, especially Prof. Roxann Engelstad and scientists associated with her department. Congratulations.

The Best Paper of the EMLC2007 qualifies to be presented at the PMJ in April 2007 in Yokohama, Japan and at the BACUS in September 2007 in Monterey, California. 

Dr. Uwe Behringer
Conference Chair

 
  
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