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Conference Topics

Extended Deadline for Papers:  September 10, 2007

Download the Call for Papers EMLC 2008
For writing your abstract please use this template.

A sample you can find here.

Please send your abstract to: conference-papers@vde.com

The program committee requests contributions on the topics listed below.

Mask Manufacturing
Pattern Generation and Data Preparation
Photomask- Processes and Materials
Mask Process Yield
Photomasks with RET and OPC; PSM
Mask for NGL: E-Beam, EUV; NIL etc.
Metrology Tools and Technologies
Defect Inspection- and Repair Tools
Cleaning and Pelliclization

Mask Business

Mask Business and Management
Direct Write / Maskless Technologies

Other Mask Topics

Mask Cost and Mask Development Strategy
Future Mask Demand

Lithography and Mask Applications

RET, OPC, Double Exposure, MEEF
Mask Defect Printability
Optical Materials
Immersion Lithography
Immersion Defectivity
Alternate Immersion Fluids

Emerging Mask and Lithography Technologies

EUV Mask Material
EUV Mask Infastructure
Double Exposure

Mask and Lithography Equipment 



2007 GMM