Extended Deadline for Papers: September 10, 2007
Download the Call for Papers EMLC 2008
For writing your abstract please use this template.
A sample you can find here.
Please send your abstract to: firstname.lastname@example.org
The program committee requests contributions on the topics listed below.
Pattern Generation and Data Preparation
Photomask- Processes and Materials
Mask Process Yield
Photomasks with RET and OPC; PSM
Mask for NGL: E-Beam, EUV; NIL etc.
Metrology Tools and Technologies
Defect Inspection- and Repair Tools
Cleaning and Pelliclization
Mask Business and Management
Direct Write / Maskless Technologies
Other Mask Topics
Mask Cost and Mask Development Strategy
Future Mask Demand
Lithography and Mask Applications
RET, OPC, Double Exposure, MEEF
Mask Defect Printability
Alternate Immersion Fluids
Emerging Mask and Lithography Technologies
EUV Mask Material
EUV Mask Infastructure
Mask and Lithography Equipment