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Conference Topics


Extended Deadline for Papers:  September 10, 2007

Download the Call for Papers EMLC 2008
For writing your abstract please use this template.

A sample you can find here.

Please send your abstract to: conference-papers@vde.com


The program committee requests contributions on the topics listed below.


Mask Manufacturing
 
Pattern Generation and Data Preparation
Photomask- Processes and Materials
Mask Process Yield
Photomasks with RET and OPC; PSM
Mask for NGL: E-Beam, EUV; NIL etc.
Metrology Tools and Technologies
Defect Inspection- and Repair Tools
Cleaning and Pelliclization


Mask Business

Mask Business and Management
Direct Write / Maskless Technologies


Other Mask Topics


Mask Cost and Mask Development Strategy
Future Mask Demand



Lithography and Mask Applications

RET, OPC, Double Exposure, MEEF
Resist
Mask Defect Printability
Optical Materials
Immersion Lithography
Immersion Defectivity
Alternate Immersion Fluids


Emerging Mask and Lithography Technologies

157nm
EUV Mask Material
EUV Mask Infastructure
NIL
Double Exposure


Mask and Lithography Equipment 

 

 
  
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2007 GMM